Nitrogen trifluoride is acclimated in the claret carving of silicon wafers.
Today nitrogen trifluoride is predominantly alive in the charwoman of the PECVD
accommodation in the high-volume assembly of liquid-crystal displays and
silicon-based thin-film solar cells. In these applications NF3 is initially
torn down in situ by a plasma. The consistent fluorine atoms are the alive
charwoman agents that advance the polysilicon, silicon nitride and silicon
oxide. Nitrogen trifluoride can be acclimated as able-bodied with tungsten
silicide, and tungsten produced by CVD. NF3 has been advised as an
environmentally bigger acting for sulfur hexafluoride or perfluorocarbons such
as hexafluoroethane.The action appliance of the chemicals activated in claret
processes is about beneath 20%. Therefore some of the PFCs and aswell some of
the NF3 consistently escape into the atmosphere. Modern gas abatement systems
can abatement such emissions.
Elemental fluorine has been alien as an environmentally affable backup for
nitrogen trifluoride in the accomplish of flat-panel displays and thin-film
solar cells.
Nitrogen trifluoride is aswell acclimated in hydrogen fluoride and
deuterium fluoride lasers, which are types of actinic lasers. It is adopted to
fluorine gas due to its acceptable administration properties, absorption its
ample stability.
It is accordant with animate and Monel, as able-bodied as several plastics.
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